HHV’s thin film metallization process is carried out through magnetron sputtering. With our in-house direct laser writing facility, we can achieve resolutions of 1 micron on photomasks and our lithography facility is capable of producing patterns with 40 micron line widths.
HHV’s black absorber coatings are developed using an optimal design of multiple metal-dielectric layers on stainless steel substrates. These coatings are hard and adherent and have an average reflectance of less than 1% in the visible range. They are widely used in space applications.
Reticles are optics designed for eyepieces of an imaging system that superimposes either a crosshair or concentric circle pattern on the imaged object. HHV has the complete lithography facility to make reticles with 1 micron line accuracy.