The ATS 500 is a mid sized coaters for production and large wafer R and D applications. The ATS 500 is clean room compatible and offers high throughput efficiency with a source to substrate distance of up to 20” .
Modular segmentation of system components
Supports multiple deposition processes
500 mm wide x 500 mm high, D-shaped chamber with hinged door
Full Color, Touch Screen PLC with integrated process recipe-driven process and vacuum control
Extended height versions are available for applications such as lift-off coatings