Lithography

HHV has added a new photolithography facility to develop a thin film circuit fabrication facility. Starting from the metallization of coatings, finished products with patterned circuits can be realized at this facility. This facility has been built in an ISO-7 clean room environment and ISO-5 class laminar flow stations. Spin coater, Laser writer, mask aligner & UV exposure system, wet chemical benches, ultrasonic cleaning machines, baking ovens, microscopes and profile projectors are available at this facility to make the full circuit generation over different types of substrates.

Applications:

• RF/Microwave integrated circuits
• Hybrid microwave integrated circuits
• Thin film resistors
• SAW devices
• Reticules

Facility

10,000 Clean room facility